| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gray scale mask and so on, with which a resist shape is accurately formed by avoiding formation of a stepwise shape caused by distribution of step-by-step changing light transmittance. <P>SOLUTION: The gray scale mask: is equipped with a plurality of unit cells 21 whose light transmittance values are respectively set according to desired resist shapes, wherein the unit cell 21 has an opening section 23 to transmit light and a light shielding section 22 to shield light, and the light transmittance value is determined with an area opening ratio which is a rate of an area of the opening section 23 occupying the unit cell 21; and has the area opening ratio of a range in which the resist shape is formed by making diffracted light L from a unit cell 21 on the periphery of one unit cell 21 incident on a region AR on which direct light from the one unit cell 21 is made incident out of a resist layer 60 to form the resist shape. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
