MONITORING PROCESSING OF A SUBSTRATE IN A PROCESSING CHAMBER

摘要

A substrate processing apparatus comprises a process chamber comprising walls defining an enclosure for processing a substrate, and having at least one window in a wall to allow a radiation to be transmitted therethrough. A process monitoring assembly is provided to monitor a process being conducted in the chamber. The process monitoring assembly comprises a plurality of signal sensors that each receive a radiation reflected from the substrate and that passes through the window, each signal sensor being capable of generating a signal in relation to a received radiation.