METHOD OF MANUFACTURING SEMICONDUCTOR OPTICAL DEVICE

摘要

method for manufacturing a semiconductor optical device includes forming an epitaxial structure containing at least an active layer which can emit light, of a III-V group semiconductor material; forming an insulating layer over the epitaxial structure, which prevents the V group element from escaping from the epitaxial structure during heat treatment; heat treating the epitaxial structure at at least 800 degrees C; and removing the insulating layer, thereby enhancing the reliability of the device.