| 摘要 |
This invention relates to compositions of matter that include a polymerization stress reducing monomer, which may be one of the novel tetraoxaspiroalkanes disclosed herein, and an organosilicon monomer, such as a silorane. These matrix resin compositions may also include a photoinitiator, a photosensitizer, a reaction promoter, and other additives. The photopolymerizable compositions of this invention are useful for a variety of applications including use as dental matrix resin systems, such as restorative composites.
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