Methode und Vorrichtung für die Definition von Mustern einer Fotomaske mittels einer Booleschen Kombination der Designdaten mit skalierten Designdaten

摘要

A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate.