发明名称 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high sensitivity to a blue violet laser, excellent in light stability and heat stability under a yellow safe light, having very high storage stability, and capable of efficiently forming a pattern with high definition, a pattern forming material and a photosensitive laminate obtained by laminating the photosensitive composition, and a pattern forming apparatus and a pattern forming method. <P>SOLUTION: The photosensitive composition contains at least a binder, a polymerizable compound, a heat crosslinking agent and a photopolymerization initiator compound, wherein the photopolymerization initiator compound contains an acridine derivative and an onium compound. The pattern forming material has a support and at least a photosensitive layer comprising the photosensitive composition on the support. The photosensitive laminate has a photosensitive layer comprising the photosensitive composition. The pattern forming apparatus is equipped with the photosensitive laminate and has at least a light illuminating means and a light modulating means. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007078889(A) 申请公布日期 2007.03.29
申请号 JP20050264481 申请日期 2005.09.12
申请人 FUJIFILM CORP 发明人 IWASAKI MASAYUKI
分类号 G03F7/031;G03F7/004;G03F7/027;G03F7/029;G03F7/20;H05K3/00;H05K3/28 主分类号 G03F7/031
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