发明名称 A DEVICE AND A METHOD FOR DETECTING AN END POINT OF POLISHING A SUBSTRATE
摘要 A two-dimensional image of a substrate surface targeted for polishing is periodically picked up, and the image is analyzed to obtain an entropy H 1 , H 2 of the two-dimensional image. An end point of polishing is then determined according to the entropy H 1 , H 2 . Alternatively, other image characteristic value such as a difference statistic of the image may be employed instead of the entropy H 1 , H 2.
申请公布号 KR100701517(B1) 申请公布日期 2007.03.29
申请号 KR20020013016 申请日期 2002.03.11
申请人 发明人
分类号 B24B49/12;H01L21/304;B24B37/013;G06T1/00;G06T7/00;G06T7/40 主分类号 B24B49/12
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