APPARATUS AND PROCESS FOR SURFACE TREATMENT OF SUBSTRATE USING AN ACTIVATED REACTIVE GAS

摘要

An apparatus and process for treating at least a portion of the surface of a substrate is described herein. In one aspect, the apparatus a processing chamber comprising an inner volume, the substrate, and an exhaust manifold; an activated reactive gas supply source wherein a process gas comprising one or more reactive gases and optionally an additive gas is activated by one or mo re energy sources to provide the activated reactive gas; and a distribution conduit, which is in fluid communication with the inner volume and the suppl y source, comprising: a plurality of openings that direct the activated reacti ve gas into the inner volume, wherein the activated reactive gas contacts the surface and provides a spent activated reactive gas and/or volatile products that are withdrawn from the inner volume through the exhaust manifold.