发明名称 MONOLITHIC TWO WAVELENGTH SEMICONDUCTOR LASER AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor laser where sufficient disordering in an active layer of an infrared semiconductor laser occurs when a red semiconductor laser and the infrared semiconductor laser are disposed on a single substrate and an end face window structure is to be formed. SOLUTION: Hydrogen concentration (1.5e18 cm<SP>-3</SP>) of the fourth cladding layer 110 of the infrared semiconductor laser is higher than hydrogen concentration (1e18 cm<SP>-3</SP>) of the second cladding layer 105 in the first semiconductor laser red semiconductor laser. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007081173(A) 申请公布日期 2007.03.29
申请号 JP20050267730 申请日期 2005.09.15
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MATSUKI YOSHIYUKI;MANNOU MASAYA;FUKUHISA TOSHIYA;UKAI TSUTOMU
分类号 H01S5/16;H01S5/40 主分类号 H01S5/16
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