发明名称 |
MONOLITHIC TWO WAVELENGTH SEMICONDUCTOR LASER AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor laser where sufficient disordering in an active layer of an infrared semiconductor laser occurs when a red semiconductor laser and the infrared semiconductor laser are disposed on a single substrate and an end face window structure is to be formed. SOLUTION: Hydrogen concentration (1.5e18 cm<SP>-3</SP>) of the fourth cladding layer 110 of the infrared semiconductor laser is higher than hydrogen concentration (1e18 cm<SP>-3</SP>) of the second cladding layer 105 in the first semiconductor laser red semiconductor laser. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007081173(A) |
申请公布日期 |
2007.03.29 |
申请号 |
JP20050267730 |
申请日期 |
2005.09.15 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
MATSUKI YOSHIYUKI;MANNOU MASAYA;FUKUHISA TOSHIYA;UKAI TSUTOMU |
分类号 |
H01S5/16;H01S5/40 |
主分类号 |
H01S5/16 |
代理机构 |
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地址 |
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