发明名称 VACUUM VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus for reducing a heat dissipation loss, by enabling a lid 11 of a crucible 6 containing a vapor deposition material to be closed and opened even in a vacuum atmosphere. SOLUTION: This vacuum vapor deposition apparatus comprises: the crucible 6 placed right under a coating roller 4 for supporting and moving a film 3 to be vapor-deposited; a container-moving means for moving the crucible 6 to a working position for vapor deposition and a retracting position for cleaning; and a lid opening and closing means 12 for opening and closing a lid 11 which moves along with the movement of the crucible 6 and uses the movement of the crucible 6 as a driving source. The lid opening and closing means 12 opens the lid 11 when the crucible 6 is at the working position, and closes the lid 11 when the crucible 6 is at the retracting position. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007077458(A) 申请公布日期 2007.03.29
申请号 JP20050267888 申请日期 2005.09.15
申请人 DAINIPPON PRINTING CO LTD 发明人 KENMOKU TATSUHIKO
分类号 C23C14/54;C23C14/24;C23C14/56 主分类号 C23C14/54
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