COMPOSITION FOR FORMING EASILY CLEANABLE FILM AND BLOCK COPOLYMER

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a film having high cleanability for a wide range of stains from sticky stains to minute stains such as of bacteria. SOLUTION: The composition for forming an easily cleanable film contains a block copolymer comprising a block formed from a hydrophilic monomer and a block formed from a hydrophobic monomer. In the block copolymer comprising the block formed from the hydrophilic monomer and the block formed from the hydrophobic monomer, the hydrophilic monomer contains a monomer having ethylene oxide repeating units in its side chain. COPYRIGHT: (C)2007,JPO&INPIT