发明名称 |
PHOTORADIAL- AND PHOTOCATION-CURABLE COMPOSITION |
摘要 |
<p>The invention provides a curable composition which is cured by both photoradical-curing mechanism and photocation-curing mechanism and is improved in curability. The invention relates to a curable composition which is cured by both photoradical-curing mechanism and photocation-curing mechanism, which comprises (A) a vinyl polymer having in the molecule two or more groups represented by the general formula (1): -OC(O)C(R<SUP>a</SUP>)=CH<SUB>2</SUB> (1) (wherein R<SUP>a</SUP> is hydrogen or an organic group having 1 to 20 carbon atoms) with the proviso that at least one of the groups is present at a molecular end and (B) an epoxy compound and/or an oxetane compound, characterized in that the concentration of N-containing compounds in the component (A) is 1000ppm or below and the concentration thereof based on the component (B) is 2300ppm or below.</p> |
申请公布号 |
WO2007034914(A1) |
申请公布日期 |
2007.03.29 |
申请号 |
WO2006JP318851 |
申请日期 |
2006.09.22 |
申请人 |
KANEKA CORPORATION;OGAWA, KOHEI;NAKAGAWA, YOSHIKI |
发明人 |
OGAWA, KOHEI;NAKAGAWA, YOSHIKI |
分类号 |
C08G59/40;C08F20/00;C08F290/04;C08G65/18 |
主分类号 |
C08G59/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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