| 摘要 |
<p>A display device in which a frame area required for a dummy pixel section and a symbol notation is reduced even if the display device has the dummy pixel section and denotes a necessarily large symbol is realized. In a dummy pixel section (122) of the display device, the distances from a contact hole (12) to a contact hole (13) and from the contact hole (12) to a through hole (14) can be shortened as compared with those in pixel forming sections (112a, 112b) by reducing the number of gate electrodes of a thin-film transistor comprising a semiconductor layer (11) to two, thus making it possible to change the installation locations of the contact hole (13) and the through hole (14) downward in the figure. Electrodes corresponding to a capacitance line (170) are only provided in the vicinity of the center of the dummy pixel section (122). With these configurations, a broad transparent area can be secured, so that a sufficiently large symbol (22) can be denoted in the dummy pixel section (122).</p> |
