| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition or the like which has a nearly uniform sensitivity distribution to exposure light having a wavelength of 400-410 nm, is not affected by variation in exposure wavelength during laser exposure, excels in pattern reproducibility, suppresses variation in pattern profile, and can be handled in a daylight environment. <P>SOLUTION: The photosensitive composition contains a binder, a polymerizable compound, a photopolymerization initiator, a sensitizer and a heat crosslinking agent, wherein the sensitizer contains two or more sensitizers each having an absorption maximum at a wavelength of 340-500 nm. The photosensitive composition preferably has a maximum value of spectral sensitivity in a wavelength region of 380-420 nm, and it is preferable that smallest exposure amount S capable of forming a pattern in a region of 400-410 nm is ≤210 mJ/cm<SP>2</SP>and the maximum value Smax of smallest exposure amount and the minimum value Smin of smallest exposure amount in the region satisfy formula: Smax/Smnin≤1.2. <P>COPYRIGHT: (C)2007,JPO&INPIT |
