| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-frequency power supply device in which an extinction phenomenon of plasma and a hunting phenomenon in matching process are not generated in a wide region of the absolute value ¾Γ¾of the reflection coefficient and extra increase of power consumption is not brought about, even when a fluctuation region exists. <P>SOLUTION: When the reflection coefficient of the power calculated by a reflection coefficient operation part 22 is within any of an inner region out of a plurality of inner regions established by a region setting storage part 23, a PL control is performed, and when the reflection coefficient goes out from inside of any of the outer region to the outside of the outer region out of a plurality of outer regions, a PF control is carried out. <P>COPYRIGHT: (C)2007,JPO&INPIT |
