发明名称 NANO-IMPRINT METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To form a circuit pattern on a transfer layer formed on a side surface of a cylindrical substrate by utilizing nano-imprint technology. SOLUTION: The method is characterized by transferring a pattern formed on the surface of a mold 104 to a transfer layer formed on a part or the whole of a side surface of a cylindrical or columner substrate 102. The device is characterized by having a first tool coming into contact with the substrate 102, a second tool rotatably supporting the first tool, a pressing part linked to the second tool and pressing the substrate to the mold 104, a movable holding part holding the mold 104 while moving the mold 104 in a direction nearly orthogonal to the pressing force. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007076358(A) 申请公布日期 2007.03.29
申请号 JP20060138720 申请日期 2006.05.18
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;NAMIKI PRECISION JEWEL CO LTD 发明人 MAEDA RYUTARO;GOTO HIROSHI;NAKAMURA KAZUYA;IMAIZUMI NOBUO;HIYAMA YOSHITO
分类号 B29C59/02;B29C59/04;B81C99/00;B82B3/00;H05K3/00;H05K3/10 主分类号 B29C59/02
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