发明名称 |
NANO-IMPRINT METHOD AND DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To form a circuit pattern on a transfer layer formed on a side surface of a cylindrical substrate by utilizing nano-imprint technology. SOLUTION: The method is characterized by transferring a pattern formed on the surface of a mold 104 to a transfer layer formed on a part or the whole of a side surface of a cylindrical or columner substrate 102. The device is characterized by having a first tool coming into contact with the substrate 102, a second tool rotatably supporting the first tool, a pressing part linked to the second tool and pressing the substrate to the mold 104, a movable holding part holding the mold 104 while moving the mold 104 in a direction nearly orthogonal to the pressing force. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007076358(A) |
申请公布日期 |
2007.03.29 |
申请号 |
JP20060138720 |
申请日期 |
2006.05.18 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;NAMIKI PRECISION JEWEL CO LTD |
发明人 |
MAEDA RYUTARO;GOTO HIROSHI;NAKAMURA KAZUYA;IMAIZUMI NOBUO;HIYAMA YOSHITO |
分类号 |
B29C59/02;B29C59/04;B81C99/00;B82B3/00;H05K3/00;H05K3/10 |
主分类号 |
B29C59/02 |
代理机构 |
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地址 |
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