| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern exposure method superior in mass production for simultaneously exposing a planar part and a side part by enhancing resolution of exposure of the planar part. <P>SOLUTION: The pattern exposure method comprises using an exposure mask for a mask pattern on the other surface by forming a shading pattern on one surface of a transparent substrate, arranging the exposure mask so as to allow the surface of the side forming the mask pattern to oppose in parallel to the planar part, and projecting a prescribed pattern on the planar part and the side part by irradiation with light from the side forming the shading pattern in pattern exposure projecting the mask pattern on the planar part and the side part of an object to be exposed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
