发明名称 METHOD FOR GENERATING MASK PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method for generating a mask pattern in which a variety of masks can be generated by setting the phase management of a mask and the management unit of offset for increasing randomness separately, and managing the position of a nozzle and the kind of a table to be copied. SOLUTION: In the method for generating a mask pattern, generation unit of mask and management unit of offset are set separately and a table to be used is managed by the position of a nozzle. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007076102(A) 申请公布日期 2007.03.29
申请号 JP20050265304 申请日期 2005.09.13
申请人 CANON INC 发明人 SHISHIDO KAZUNARI
分类号 B41J2/01 主分类号 B41J2/01
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