发明名称 Method For Predicting The Formation Of Silicon Nanocrystals In Embedded Oxide Matrices
摘要 A method for predicting the formation of silicon nanocrystals in an oxide matrix is disclosed. Initially, fundamental data for a set of microscopic processes that can occur during one or more material processing operations are obtained. Kinetic models are then built by utilizing the fundamental data for a set of reactions that can contribute substantially to the formation of silicon nanocrystals in a silicon oxide matrix. Finally, the kinetic models are applied to predict shape, size distribution, spatial arrangements of silicon nanocrystals.
申请公布号 US2007072318(A1) 申请公布日期 2007.03.29
申请号 US20060537423 申请日期 2006.09.29
申请人 HWANG GYEONG S;YU DECAI 发明人 HWANG GYEONG S.;YU DECAI
分类号 H01L21/66;G01R31/26 主分类号 H01L21/66
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