发明名称 |
OPTICAL SYSTEM, EXPOSING APPARATUS AND EXPOSING METHOD |
摘要 |
<p>An optical system includes a reflecting mirror to which rays are incident across a relatively wide incidence angle range, while well suppressing a change in a polarization state in an optical path of a beam incident substantially as linearly polarized light. The optical system has a first deflecting plane mirror (M11) and a second deflecting plane mirror (M12) and a substantially linearly polarized beam is incident to the optical system. Each of the first deflecting plane mirror and the second deflecting plane mirror is so arranged that a change from a phase difference between p-polarized incident light to a reflecting surface and s-polarized incident light to the reflecting surface, to a phase difference between reflected light of the p-polarized incident light to the reflecting surface and reflected light of the s-polarized incident light to the reflecting surface is within 30° for all rays incident to the reflecting surface.</p> |
申请公布号 |
EP1767978(A1) |
申请公布日期 |
2007.03.28 |
申请号 |
EP20050748799 |
申请日期 |
2005.06.09 |
申请人 |
NIKON CORPORATION |
发明人 |
OMURA, YASUHIRO;IIDA, HARUHISA;TSUDA, TAKESHI |
分类号 |
G02B17/08;G02B5/08;G03F7/20;H01L21/027 |
主分类号 |
G02B17/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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