发明名称 OPTICAL SYSTEM, EXPOSING APPARATUS AND EXPOSING METHOD
摘要 <p>An optical system includes a reflecting mirror to which rays are incident across a relatively wide incidence angle range, while well suppressing a change in a polarization state in an optical path of a beam incident substantially as linearly polarized light. The optical system has a first deflecting plane mirror (M11) and a second deflecting plane mirror (M12) and a substantially linearly polarized beam is incident to the optical system. Each of the first deflecting plane mirror and the second deflecting plane mirror is so arranged that a change from a phase difference between p-polarized incident light to a reflecting surface and s-polarized incident light to the reflecting surface, to a phase difference between reflected light of the p-polarized incident light to the reflecting surface and reflected light of the s-polarized incident light to the reflecting surface is within 30° for all rays incident to the reflecting surface.</p>
申请公布号 EP1767978(A1) 申请公布日期 2007.03.28
申请号 EP20050748799 申请日期 2005.06.09
申请人 NIKON CORPORATION 发明人 OMURA, YASUHIRO;IIDA, HARUHISA;TSUDA, TAKESHI
分类号 G02B17/08;G02B5/08;G03F7/20;H01L21/027 主分类号 G02B17/08
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