| 摘要 |
<p>An excimer laser and a line-narrowing module capable of increasing and maximizing production yield in semiconductor manufacturing are disclosed. The line-narrowing module utilizes a beam expander that passes laser light, produced by and incident from a generator of the excimer laser and collimates the laser light in one direction. A diffraction grating receives the collimated laser light and diffracts the laser light and causes a traveling direction of the laser light to be separated according to an associated wavelength of the laser light. A multi-wavelength reflector located at a reflecting position on one side between the diffraction grating and the beam expander in order to re-enter the laser light having a multi-wavelength into the generator through the beam expander. The multi-wavelength reflector reflects the laser light consisting of a plurality of wavelengths among the laser light whose traveling direction is separated from the diffraction grating onto the beam expander.</p> |
