| 摘要 |
A triple shower head and an ALD(Atomic Layer Deposition) apparatus with the same are provided to prevent the generation of clogging and to control selectively the temperature corresponding to each source by using an additional path capable of diffusing a plurality of sources into a chamber. A triple shower head includes a circle type source supply plate, a doughnut type source supply plate, and a baffle. The circle type source supply plate(210) is used for diffusing a first process source downward through a first source supply line. The doughnut type source supply plate(220) is connected to a first lower portion of the circle type source supply plate. Second and third source supply lines are connected to both sides of the doughnut type source supply plate in order to diffuse second and third process sources toward a center portion. The baffle is connected to a second lower portion of the doughnut type source supply plate. The baffle includes a plurality of source spraying holes capable of spraying each process source downward.
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