AREA BASED OPTICAL PROXIMITY CORRECTION IN RASTER SCAN PRINTING
摘要
Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for "post-rasterization" by manipulating the grayscale values of pixel maps.
申请公布号
EP1766572(A1)
申请公布日期
2007.03.28
申请号
EP20050789232
申请日期
2005.07.01
申请人
APPLIED MATERIALS, INC.
发明人
CHABRECK, THOMAS, E.;HOWELLS, SAMUEL, C.;HUBBARD, JOHN, J.;TEITZEL, ROBIN, L.
