发明名称 |
ION BEAM SCANNING SYSTEMS AND METHODS FOR IMPROVED ION IMPLANTATION UNIFORMITY |
摘要 |
<p>Ion implantation systems and scanning systems therefor are provided, in which focus adjustment apparatus is provided to dynamically adjust a focal property of an ion beam to compensate for at least one time varying focal property of a scanner. Methods are provided for providing a scanned ion beam to a workpiece, comprising dynamically adjusting a focal property of an ion beam, scanning the ion beam to create a scanned ion beam, and directing the scanned ion beam toward a workpiece.</p> |
申请公布号 |
EP1766654(A1) |
申请公布日期 |
2007.03.28 |
申请号 |
EP20050758662 |
申请日期 |
2005.06.06 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
VANDERBERG, BO;RAY, ANDREW;WENZEL, KEVIN |
分类号 |
H01J37/317 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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