发明名称 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
摘要 An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only.
申请公布号 US7196343(B2) 申请公布日期 2007.03.27
申请号 US20040025851 申请日期 2004.12.30
申请人 ASML NETHERLANDS B.V. 发明人 VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;BAKKER LEVINUS PIETER;KLUNDER DERK JAN WILFRED
分类号 G03F7/20;G02B27/14 主分类号 G03F7/20
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