发明名称 |
Positive resist composition and pattern formation method using the same |
摘要 |
A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and a pattern formation method using the positive resist composition.
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申请公布号 |
US7195856(B2) |
申请公布日期 |
2007.03.27 |
申请号 |
US20040929443 |
申请日期 |
2004.08.31 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
MIZUTANI KAZUYOSHI;SASAKI TOMOYA;KANNA SHINICHI |
分类号 |
G03F7/00;G03F7/039;G03C1/76;G03F7/004;H01L21/027 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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