发明名称 |
Pattern forming method and electric device fabricating method using the same |
摘要 |
A pattern forming method includes: forming an etching-subject layer on a substrate; forming a Ti layer on the etching-subject layer; forming a TiOx layer by irradiating light on a portion of the Ti layer using a mask; etching the Ti layer to form a TiOx pattern; etching the etching-subject layer using the TiOx pattern as a mask; and removing the TiOx pattern.
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申请公布号 |
US7196015(B2) |
申请公布日期 |
2007.03.27 |
申请号 |
US20030669467 |
申请日期 |
2003.09.25 |
申请人 |
LG.PHILIPS LCD CO., LTD. |
发明人 |
CHAE GEE-SUNG;JO GYOO-CHUL;HWANG YONG-SUP |
分类号 |
H01L21/302;H01L21/3065;H01L21/027;H01L21/033;H01L21/28;H01L21/3213;H01L21/336 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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