| 摘要 |
Semiconductor drying equipments having a spray unit and a substrate space adjusting cassette are provided to completely remove deionized water from a semiconductor substrate by using the spray unit and a substrate space adjusting cassette to prevent a collapse of semiconductor patterns. A vapor injector(30) and a deionized water tank(70) are provided on an upper and a lower of a semiconductor drying equipment(80), respectively. An injection unit(20) is arranged in the vapor injector and has an injection support and injection holes. A substrate space adjusting cassette(50) is provided in the deionized water tank and has slot grooves and slot rails. The slot rails are located at both sides of the substrate space adjusting cassette to induce a horizontal movement of the slot grooves on which the semiconductor substrates are placed.
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