发明名称 Method for fabricating wire and method for fabricating thin film transistor panel using the same
摘要 A method of forming a line and a method of fabricating a TFT(tin film transistor) substrate using the same are provided to form a precise pattern without an additional photo-lithography process by transferring and sintering conductive slurry using a printed board. Conductive slurry(31) filled in a printing groove(11) of a printed board is transferred on a lower structure. The conductive slurry is sintered. In the transferring, the conductive slurry filled in the printing groove is transferred on a transfer sheet(51) provided on a transfer roller(50). Then, the conductive slurry transferred on the transfer sheet is transferred on the lower structure.
申请公布号 KR20070033508(A) 申请公布日期 2007.03.27
申请号 KR20050087735 申请日期 2005.09.21
申请人 发明人
分类号 G02F1/136 主分类号 G02F1/136
代理机构 代理人
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