| 摘要 |
<p>Provided is a positive photosensitive composition excellent in an etching factor and adhesion. The composition includes: (A) an alkali-soluble high molecular substance having in the molecule thereof at least one carboxyl group, (B) a photo-thermal conversion material which absorbs infrared rays from an image exposure light source to convert the rays to heat, and (C) a silane coupling agent. The silane coupling agent (C) is preferably a silane coupling agent having an alkoxysilyl group and at least one functional group selected from the group consisting of imidazole, vinyl, epoxy, methacryloxy, acryloxy, amino, mercapto, isocyanate, styryl, and polysulfide groups.</p> |
