| 摘要 |
Semiconductor manufacturing equipment and a controlling method thereof are provided to prevent the contamination of a chamber and to reduce the loss of wafers by using a controller. Semiconductor manufacturing equipment includes a chamber(10), a vacuum line connected with the chamber, a dry pump(20), a roughing valve between the chamber and the dry pump, a predetermined valve between the roughing valve and the dry pump, a turbo pump on the vacuum line, a high vacuum valve, and a controller. The high vacuum valve is installed on the vacuum line. The high vacuum valve is located between the turbo pump and the chamber. The controller(80) is used for detecting an abnormal state of the dry pump.
|
