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发明名称
Atomic Layer Deposition Method using Plasma
摘要
申请公布号
KR100699362(B1)
申请公布日期
2007.03.26
申请号
KR20040024946
申请日期
2004.04.12
申请人
发明人
分类号
C23C16/44
主分类号
C23C16/44
代理机构
代理人
主权项
地址
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