| 摘要 |
<p>An apparatus for coating a substrate is provided to principally remove solvent while applying photoresist to surface of the substrate so as to reduce time for drying the applied photoresist by adopting an extended slit nozzle for output a coating agent, and a drying unit for evaporating the solvent contained in the coating agent. The apparatus(300) comprises: a slit nozzle(310) arranged on a substrate to relatively move to the substrate and having an extended outlet in transverse direction to output a coating agent to the substrate; a drying unit(330) moving along the slit nozzle and evaporating a solvent contained in the coating agent output from the slit nozzle; and a suction unit(340) moving along the drying unit and inhaling the evaporated solvent. The drying unit has an injection hole formed toward the coated substrate through which hot gas is injected to the coating agent applied to the substrate, as well as a heating device inside the drying unit.</p> |
