| 摘要 |
<p>A wafer transfer apparatus of exposure equipment and a driving method thereof are provided to reduce a processing time and to improve the throughput by exchanging simultaneously wafers with each other using a first and second arm parts. A wafer transfer apparatus of exposure equipment includes a fixing unit(110) prolonged in a cross direction, a guide unit(120) for loading/unloading a first and second wafers on the fixing unit, and a wafer stage(140). The guide unit is composed of a body(132) fixed to an upper portion of the fixing unit, a first arm part(136) prolonged from one side of the body, a second arm part(138) prolonged from the other side of the body. End portions of the first and second arm parts have different heights.</p> |
