发明名称 |
Method and Structure for Electrostatic Discharge Protection of Photomasks |
摘要 |
A mask for manufacturing integrated circuits and use of the mask. The mask has a mask substrate. The mask also has an active mask region within a first portion of the mask substrate. The active region is adapted to accumulate a pre-determined level of static electricity. The mask also has a first guard ring structure surrounding a portion of the active mask region to isolate the active region from an outer region of the mask substrate and a second guard ring structure having at least one fuse structure surrounding a portion of the first guard ring structure. The fuse structure is operably coupled to the active region to absorb a current from static electricity. The static electricity is accumulated by the active region to the pre-determined level and being discharged as current to the fuse structure while maintaining the active region free from damage from the static electricity.
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申请公布号 |
US2007066006(A1) |
申请公布日期 |
2007.03.22 |
申请号 |
US20060552142 |
申请日期 |
2006.10.23 |
申请人 |
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION |
发明人 |
KUO KUEI-CHI |
分类号 |
H01L21/8238;G03F1/00;G03F1/14;H01L21/027;H01L21/331;H01L21/336;H01L21/44;H01L21/82;H01L23/58;H01L29/00 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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