发明名称 OBSERVATION DEVICE OF FINE PATTERN AND CORRECTION DEVICE OF FINE PATTERN USING IT
摘要 PROBLEM TO BE SOLVED: To provide a correction device of a fine pattern capable of finely adjusting the quantity of illumination light at a low level. SOLUTION: This observation device of the fine pattern is a device for correcting the flaw of the fine pattern formed on a glass substrate 8 to be corrected and equipped with an optical filter plate 26 having predetermined light transmittanceα, a light source 20 for transmission illumination for irradiating the glass substrate 8 to be corrected with illumination light through the optical filter plate 26, an adjusting device 27 for adjusting the quantity of light of the light source 20 and an observation optical system 1 for observing the transmitted illumination light of the fine pattern. Accordingly, the quantity of the transmitted illumination light can be finely adjusted at a low level and a fine flaw or color irregularity can be detected. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007071693(A) 申请公布日期 2007.03.22
申请号 JP20050258919 申请日期 2005.09.07
申请人 NTN CORP 发明人 MAEDA KAZUNARI
分类号 G01N21/84;G01N21/958;G02F1/13 主分类号 G01N21/84
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