| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and device capable of high-accuracy inspection of the defect of a photomask having a light-shielding part, light-transmitting part and fine pattern part, in a short time. <P>SOLUTION: The defect of the photomask inspection method in which the light-shielding part, light-transmitting part and fine pattern part are provided, for the region at least provided with the light-shielding part and the light-transmitting part are formed, using the transmissivity signal obtained by scanning the pattern using the comparison means for detecting the defect, by using the threshold previously determined pattern defect for the pattern defect signal, based on the pattern comparison, at least for the fine patten part, the defect is detected, by using the previously provided transmissivity defect extracting threshold for the transmissivity signal detected by scanning the mask. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
