PROCESS FOR CLEANING WAFERS IN AN IN-LINE CLEANING PROCESS

摘要

A wafer cleaning process includes the steps of supplying a cleaning liquid while rotating the wafer at a first rotational speed, supplying a rinsing liquid on the wafer at a second rotational speed substantially equal to the first rotational speed, supplying a rinsing liquid on the central area of the wafer while substantially stopping the wafer, and rotating the wafer at a fourth rotational speed higher than the first and second rotational speeds to scatter the stored rinsing liquid by a centrifugal force.