| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of forming a resist pattern with good mask reproducibility and a resist pattern forming method. <P>SOLUTION: The resist composition contains a resin component (A) the alkali solubility of which varies by the action of an acid and an acid generator component (B) capable of generating an acid upon exposure, wherein the acid generator component (B) contains an onium salt (B0) having an anion moiety represented by a general formula (b'-0), wherein R<SB>0</SB>is a 1-15C straight chain, branched chain or cyclic chlorinated alkyl group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
