METHOD OF MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK

摘要

PROBLEM TO BE SOLVED: To provide a substrate with: a multilayer reflective film which has high surface smoothness, can increase the reflectivity of exposure light, and has few defects; a high-quality reflective mask blank which has no transfer defects and increases the reflectivity of exposure light of the multilayer reflective layer; and a high-quality reflective mask which has no pattern defects caused by surface defects on the reflection plane of the mask and has excellent pattern transfer.

SOLUTION: A base film 6 is formed on a substrate 1. The base film 6 is formed by combining a step of normal incidence film formation, and a step of oblique-incidence film formation. A multilayer reflective film 2 is formed on the base film 6 to obtain a substrate 30 with the multilayer reflective film. An absorber film is formed on the multilayer reflective film 2 of the substrate 30 with the multilayer reflective film to obtain the reflective mask blank. Further, a pattern is formed on the absorber film of the reflective mask blank to obtain the reflective mask.

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