| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing liquid composition reducing roll-off without lowering polishing speed and to provide a method for polishing. <P>SOLUTION: The polishing liquid composition comprises a polishing agent, an acid, an oxidant, water and a nonionic surfactant represented by the following general formula (1). X-(EO)<SB>l</SB>(PO)<SB>m</SB>(BO)<SB>n</SB>-Y (1). [In the formula, EO is an oxyethylene group, PO is an oxypropylene group, BO is an oxybutylene group, l, m, n are each an added mole number, and l+m+n is 8-400, X is an -OR<SP>1</SP>group, -OH group or -OCOR<SP>2</SP>group (R<SP>1</SP>and R<SP>2</SP>are each a hydrocarbon group), Y is -R<SP>3</SP>group, H or -COR<SP>4</SP>group (R<SP>3</SP>and R<SP>4</SP>are each a hydrocarbon group)]. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
