发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can improve conductivity between a capacitor electrode and a contact plug, and to provide its manufacturing method. SOLUTION: The semiconductor device has an insulating film 15-1; a contact plug 16 which is provided in the insulating film and is primarily composed of metal; a first adhesion film 33-1 which is provided on the insulating film, has higher oxygen affinity than the metal, and is primarily composed of an oxide; a first capacitor electrode 21 which is provided on the contact plug and on the first adhesion film, and works to prevent diffusion of oxygen; a capacitor insulating film 22 provided on the first capacitor electrode; and a second capacitor electrode 23 provided on the capacitor insulating film. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007073750(A) 申请公布日期 2007.03.22
申请号 JP20050259420 申请日期 2005.09.07
申请人 TOSHIBA CORP 发明人 OZAKI TORU;KUMURA YOSHINORI;SHIMOJO YOSHIRO;SHUDO SUSUMU
分类号 H01L21/8246;H01L21/768;H01L23/522;H01L27/105 主分类号 H01L21/8246
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