发明名称 RADIATION SENSITIVE RESIN COMPOSITION AND RADIATION SENSITIVE ACID GENERATOR FOR USE IN THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high resolution and a wide range of optimum exposure energy, and to provide a radiation sensitive acid generator used to prepare such a radiation sensitive resin composition having high resolution and a wide range of optimum exposure energy. <P>SOLUTION: The radiation sensitive resin composition contains (A) an alkali-insoluble or slightly alkali-soluble resin which has an acid dissociable group and becomes alkali-soluble when the acid dissociable group dissociates and (B) a radiation sensitive acid generator, wherein the acid generator (B) contains (B-1) a sulfonimide compound, (B-2) an iodonium salt and (B-3) a sulfonium salt. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007072214(A) 申请公布日期 2007.03.22
申请号 JP20050259839 申请日期 2005.09.07
申请人 JSR CORP 发明人 SHIMIZU DAISUKE;MIZUNO HIROMI;YOSHIDA KOICHIRO;NAGAI TOMOKI
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
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