| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition used in a process of producing a semiconductor such as IC, in production of a circuit board of a liquid crystal, a thermal head or the like and in another photofabrication process, excellent in pattern profile and exposure latitude, and improved in sensitivity in EUV exposure and dissolution contrast, and a pattern forming method using the photosensitive composition. <P>SOLUTION: The photosensitive composition contains a compound of a specific structure. The pattern forming method using the photosensitive composition is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
