| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide deposited plate manufacturing equipment and deposited plate manufacturing method which prevents a bad influence on the production of a deposited plate, by appropriately treating the fragments of the deposited plate due to self-destruction of the deposited plate coagulated and deposited on the surface of a cooled material. <P>SOLUTION: Silicon is heated by a melting furnace 24 into a melt 23. Then, the cooled material 25 which is an original plate for manufacturing the deposited plate is dipped into the melt by means of a dipping means 27, and then is pulled out of the melt to make the silicon coagulate and deposit on the surface of the cooled body, thus fabricating a sheet-like silicon 48. In fabricating the sheet-like silicon, a bucket 27 is arranged in the middle of a transfer path wherein the cooled material 25 is transferred in a direction of going away from the position above the melt. The bucket 27 receives the sheet-like silicon when it separates and falls away from the cooled material. The falling object received by the bucket is moved to the side having a larger storage capacity within the bucket by means of a falling object moving means 28, and then is put into the melting furnace by a falling object rethrowing means 29 if necessary. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
