Photomask and pattern formation method and mask data generation method using the same

摘要

A pattern 121 provided on a transparent substrate 100 as a mask pattern includes partial patterns 121 A and 121 B. Each of the partial patterns 121 A and 121 B has a mask enhancer structure including a phase shifter 102 for transmitting exposing light in an opposite phase with respect to a transparent portion and a shielding portion 101 surrounding the phase shifter 102. The partial pattern 121 A is close to other patterns 122 and 123 at distances not larger than a given distance with the transparent portion sandwiched therebetween. The width of the phase shifter 102 A of the partial pattern 121 A is smaller than the width of the phase shifter 102 B of the partial pattern 121 B.