发明名称 Defectivity and process control of electroless deposition in microelectronics applications
摘要 Methods and compositions for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices. Grain refiners, levelers, oxygen scavengers, and stabilizers for electroless Co and Ni deposition solutions.
申请公布号 US2007066059(A1) 申请公布日期 2007.03.22
申请号 US20050243876 申请日期 2005.10.05
申请人 ENTHONE INC. 发明人 CHEN QINGYUN;VALVERDE CHARLES;PANECCASIO VINCENT;PETROV NICOLAI;STRITCH DANIEL;WITT CHRISTIAN;HURTUBIES RICHARD
分类号 H01L21/44 主分类号 H01L21/44
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