发明名称 MASK HOLDER AND APPARATUS FOR MANUFACTURING PHOTOMASK
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask holder that aligns the position of a mask holder and a photomask substrate on an arm, without having to install an aligner, in an apparatus for manufacturing a photomask. <P>SOLUTION: The mask holder including a frame, a substrate-holding part and a position correction slider is characterized in that the position correction slider comprises a slider part and a driving part; the slider part has a descending slope, starting from the upper part of the frame to the center of the mask holder with the inclination angle variable by swinging inclination angle by vibration; when the inclination angle is increased, the lower end of the slider reaches the inner end of the frame; when a photomask substrate is mounted, the slider slides and lowers the end part of the photomask substrate, while increasing the inclination angle, so as to correct misalignment of the photomask, and accurately guides the photomask substrate to a substrate-holding part to keep the photomask substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007072055(A) 申请公布日期 2007.03.22
申请号 JP20050257543 申请日期 2005.09.06
申请人 TOPPAN PRINTING CO LTD 发明人 MISAWA KAORU
分类号 G03F1/66;H01L21/027 主分类号 G03F1/66
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