发明名称 MANUFACTURING METHOD FOR FUNCTIONAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for simply and effectively conducting the patterning of an organic thin-film eliciting the function of at least a part of a functional device and the crystallization of large crystal grains. SOLUTION: The manufacturing method for the functional device contains a process conducting a substrate-surface treatment, in which the surface tensionσ1 of the pattern forming section of a substrate surface is made larger than thatσs of the melted liquid of an organic material, and the surface tensionσ2 of the pattern non-forming section of the substrate surface is made smaller than thatσs. The manufacturing method for the function device further contains the process in which the thin-film composed of the organic material is formed on the substrate surface, and the process in which the thin-film is heated at the melting point or higher and cooled and the crystallized organic thin-film is formed only on the pattern forming section. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007073708(A) 申请公布日期 2007.03.22
申请号 JP20050258377 申请日期 2005.09.06
申请人 MITSUI CHEMICALS INC 发明人 NAKAYAMA KENTARO;SAITO KIMIHIKO;SHICHIJO SHIRO
分类号 H01L51/40;H01L21/20;H01L21/336;H01L29/786;H01L51/05 主分类号 H01L51/40
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