| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for cleaning components having higher efficiency and cleaning effect regardless of the size of particles on an object to be cleaned. SOLUTION: A substrate is cleaned by jetting a deionized water as a cleaning liquid in which nitrogen (inert gas) is added as a secondary element to a substrate from a cleaning nozzle. A control means, in a cleaning step, periodically fluctuates at least deionized water flow rate or nitrogen flow rate for cleaning, by switching between a first cleaning state in which nitrogen is added to the deionized water at predetermined rate and a second cleaning state in which the rate of nitrogen added to the deionized water is lower than that in the first cleaning state. COPYRIGHT: (C)2007,JPO&INPIT
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